“A new electron scattering model for x-ray lithography applications”

Chapter

Publication Date:

1993

Short description:

“A new electron scattering model for x-ray lithography applications” / Santangelo, Saveria; A., Tucciarone; Messina, Giacomo. - (1993), pp. 1-29.

Iris type:

2.1 Contributo in volume (Capitolo o Saggio)

List of contributors:

Santangelo, Saveria; A., Tucciarone; Messina, Giacomo

Authors of the University:

MESSINA Giacomo

SANTANGELO Saveria

Handle:

https://iris.unirc.it/handle/20.500.12318/11698

Book title:

Process and device modeling for microelectronics