Electron scattering effects in master mask fabrication by single layer process for submicron x-ray lithography
Academic Article
Publication Date:
1989
Short description:
Electron scattering effects in master mask fabrication by single layer process for submicron x-ray lithography / Gentili, M., Lucchesini, A., Lugli, P., Messina, G., Paoletti, A., Santangelo, S., Tucciarone, A., Petrocco, G.. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICS PROCESSING AND PHENOMENA. - ISSN 0734-211X. - 7:(1989), pp. 1586-1590. [10.1116/1.584494]
Iris type:
1.1 Articolo in rivista
List of contributors:
Gentili, M.; Lucchesini, A.; Lugli, P.; Messina, G.; Paoletti, A.; Santangelo, S; Tucciarone, A.; Petrocco, G.
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