Data di Pubblicazione:
2008
Citazione:
Study of strain and wetting phenomena in porous silicon by Raman scattering / Ferrara, M.A., Donato, M.G., Sirleto, L., Messina, G., Santangelo, S., Rendina, I.. - In: JOURNAL OF RAMAN SPECTROSCOPY. - ISSN 0377-0486. - 39:2(2008), pp. 199-204. [10.1002/jrs.1846]
Abstract:
In this paper, porous silicon (PS) layers of different porosity and thickness have been investigated by Raman spectroscopy. The estimation of built-in strain in PS is reported. Moreover, wetting phenomena in PS layers have been also investigated. The results prove a reversible blue shift of Raman spectra of wetted PS layers with respect to unperturbed layers. We ascribe the shift to a compressive stress due to the increased lattice mismatch between the PS layer and the bulk silicon substrate in wetting conditions.
Tipologia CRIS:
1.1 Articolo in rivista
Elenco autori:
Ferrara, M. A.; Donato, M. G.; Sirleto, L.; Messina, G.; Santangelo, S.; Rendina, I.
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