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Study of the Thermomechanical Strain Induced by Current Pulses in SiC-Based Power MOSFET

Articolo
Data di Pubblicazione:
2021
Citazione:
Study of the Thermomechanical Strain Induced by Current Pulses in SiC-Based Power MOSFET / Anoldo, L., Triolo, C., Panarello, S., Garesci, F., Russo, S., Messina, A.A., Calabretta, M., Patane, S.. - In: IEEE ELECTRON DEVICE LETTERS. - ISSN 0741-3106. - 42:7(2021), pp. 1089-1092. [10.1109/LED.2021.3077064]
Abstract:
Power SiC MOSFETs are going to substitute Si devices by to their significantly better performances that make them much suitable in power switching applications such as electric/hybrid vehicles. The increasingly use of these devices in critical mission profiles requires an ever-higher reliability, whereas the increase of the dissipated power during high-speed working cycling due to short current pulses leads to unavoidable thermal and mechanical stress. Here, we propose a direct method to evaluate the mechanical stress due to current pulses. This method highlights that high Power SiC-based MOSFET undergoes to almost two different thermomechanical processes with completely different time scale. The results allow a link between the thermo-mechanical stress and the device failure conditions, with special focus on the current pulses effects on metal surface, as this is a main power devices weakness.
Tipologia CRIS:
1.1 Articolo in rivista
Keywords:
Coffin Manson; Power MOSFET; reliability; silicon carbide; strain wide band gap semiconductors
Elenco autori:
Anoldo, L.; Triolo, C.; Panarello, S.; Garesci, F.; Russo, S.; Messina, A. A.; Calabretta, M.; Patane, S.
Autori di Ateneo:
TRIOLO CLAUDIA
Link alla scheda completa:
https://iris.unirc.it/handle/20.500.12318/124605
Link al Full Text:
https://iris.unirc.it//retrieve/handle/20.500.12318/124605/254770/35%20Study_of_the_Thermomechanical_Strain_Induced_by_Current_Pulses_in_SiC-Based_Power_MOSFET.pdf
Pubblicato in:
IEEE ELECTRON DEVICE LETTERS
Journal
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9420737
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